Nanolithography by self-assembling polystyrene nanospheres, represents a possible method to maintain the Moore Law slope in future microelectronics. Water monodispersed polystyrene nanospheres, ranging from 100 to 1000 nanometers in diameter are distributed onto silicon or silica hydrophilic surfaces. By spinning of by Langmuir techniques, or simply drying the samples with a minimum tilting, the menisci of evaporating water alignes the nanospheres in close packed hexagonal domains. Evaporating metals onto these domains and removing the spheres by ultrasonic cleaning, ordered arrays of metal patterns can be easily transferred to silicon. In the first three pictures, a zoom in of different nanosphere domains with various thicknesses, 1 monolayer (light blue) 2 monolayers (reddish) and more (graylevels). The rightmost picture shows the 800 nm nanospheres self-assembled in a close packed domain. The video shows the mechanisms of formation of these domains, where the border of the fluid, more precisely the menisci of the water drop containing the nanospheres leads the transition from turbulence to an ordered lattice.
|Realizzato con||::: da Otto srl|