The Quantum Research Laboratory at INRiM is composed by a clean room class 100 and a grey area class 10.000 inculding the following equipment:
- Photolithography is carried out by means of a Karl Süss and of a Quintel mask-aligners, with resolution down to 800 nm, and other complementary apparatuses, like spinner, hotplate, fume hood, etc.
- Chemical, electrochemical treatments and functionalisations are carried ot in three different fume hoods. In the case of electrochemical treatments (PS formation), several cells, up to 6" diameter wafers are available.
- Si structuring is also obtained by plasma treatments in a Leybold Reactive Ion Etcher, with CF4 gas source, or by a LFE barrel etcher with gas sources: CF4, O2, H2.
- An ASM furnace, equipped with H2/O2 sources is used for Si oxidation or doping by diffusion.
- Low Pressure Chemical Vapour Deposition of Si Nitride, PolySi, Low Temperature Oxide, and Amorphous silicon is carried out by means of a Tempress and an ASM LPCVD furnaces, equipped with the following gas sources: SiH4/SiH2Cl2/NH3/O2/H2/N2O.
- Two high vacuum evaporators, from Varian and Leybold allow for both thermal and e-beam evaporation of matallic and dielectric thin films.
- An optical holography system for the definition of submicrometric periodic structures onto Si surfaces.
- Nanolithography down to 30 nanometers is carried out with a JEOL 840 SEM equipped with NanoPatternGenerationSystem from J.C. Nabity. Possibility to functionalise the nanostructures is obtained by means of a gas line linked to the SEM pre-chamber.
The characterization systems of the laboratory are briefly summarized hereafter:
- A Tencor P10 profilometer to monitor the deposition/etching processes.
- An optical microscope (1000 X) is used as a first characterization of the devices.
- A Scanning Electron Microscope, equipped with a pattern generator for e-beam lithography.
- A Raman spectrometer (Jobin Yvon) is used for the structural investigation of the sample.
- An Ocean Optics UV-Vis spectrophotometer allows for the characterization of optical devices.
- A Nicolet Nexus micro FTIR.
- A Leitz Fluorescence microscope with ccd camera
- Gas chambers for sensor characterisation in controlled atmosphere
- Two cryostats, from Leiden Cryogenics and from Janis Research for electrical measurements down to 30 mK.
|Realizzato con||::: da Otto srl|